Nikon Eclipse L200N Series Industrial Upright Microscope

Industrial Microscopes
Modularized to meet industrial microscope applications in diverse fields of industry, including semicondicator devices, packaging, FPDs, electronic components, materials and precision molds.

Eclipse L200N Series
200mm wafer and mask inspection microscope systems for reflected light defect identification.

Description

Features

Designed for 200 mm wafer and mask inspection.
Nikon CFI60-2 optical system.
Brightfield, darkfield, polarizing and DIC observation.
High-contrast, high-resolution imaging.
Long-working-distance objectives.
Ergonomic front-mounted controls.
Optical target for precise focusing.
Antistatic design to minimise material contamination.
Compatible with Digital Sight cameras and NIS-Elements.
Integrates with NWL200 wafer loader.

Benefits

Precise wafer inspection for semiconductor manufacturing.
Clear, high-contrast images for detailed defect observation.
Flexible optical inspection with multiple contrast techniques.
Improved operator comfort during repetitive inspection tasks.
Accurate focusing on low-contrast samples.
Reduced contamination risk through antistatic surfaces.
Efficient digital imaging and analysis with Nikon software and cameras.
Automation-ready workflow when integrated with the NWL200 wafer loader.