Nikon Eclipse L300N Series Industrial Upright Microscope
Industrial Microscopes
Modularized to meet industrial microscope applications in diverse fields of industry, including semicondicator devices, packaging, FPDs, electronic components, materials and precision molds.
Eclipse L300N Series
300mm wafer and mask inspection microscope systems for reflected light defect identification.
Description
Features
- Designed for 300 mm wafer inspection.
- CFI60-2 optical system with long-working-distance objectives.
- Brightfield, darkfield, POL, DIC and epi-fluorescence observation.
- Two-beam interferometry capability.
- Optical target for precise focusing.
- Ergonomic front-mounted controls.
- Fine X-Y stage movement controls.
- Antistatic design to minimise contamination.
- Compatible with Digital Sight cameras and NIS-Elements software.
Benefits
- Precise semiconductor inspection of wafers and substrates.
- High-quality, high-contrast imaging for detailed inspection.
- Flexible observation methods for different inspection requirements.
- Accurate focusing on low-contrast samples.
- Improved operator ergonomics for repetitive inspection work.
- Reduced contamination risk through antistatic construction.
- Efficient digital documentation and analysis with Nikon imaging solutions.
Downloadable Product Documents
United Kingdom
Ireland